Tantalum Pentoxide

Tantalum Pentoxide Tantalum Pentoxide (Ta­2O5) Sputtering Target
  • Product Description
  • Product Specification

In the field of 5G and communication, the technical threshold of thin film filter (TFF) required for high-density division multiplexed passive optical fiber network (DWDM) systems is high. Coating technology and coating materials have become the key to the success of this field. In order to obtain a uniform thickness and stable coating rate on the surface of the coated object, the purity and density of the sputtering target become a key concern. Taiwan Applied Crystal possesses ceramic sintering technology, which can produce high-density (>95%) tantalum pentoxide and niobium pentoxide targets. There is no spark during the sputtering (or evaporation) process, and the coating rate is stable.

Product Name Ta2O5 Sputtering Target
Color Black
Density RD>95%
Size Customized
Purity 99.99%, 4N
Melting Point 1872°C